Who we are
Founded in Jan, 2018, ESOL pioneers essential EUV solutions designed for EUV lithography
Our expertise in EUV source, EUV optics and system engineering enables EUV industry to achieve their success in EUV lithography
We have a deep market understanding in EUV lithography area
and can provide any support for all our customers who wants
cost effective EUV production.
Core Competitiveness
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Coherent EUV Source ESOL’s compact clean EUV source provides
cost effective maintenance and offers
a wide range of applications. -
EUV diffractive Optics By implementing diffraction element instead
of using an EUV mirrors can deliver EUV light
to target sample with low cost and efficiency. -
UHV and Nano System ESOL's ultra high vacuum
and nano stage technology provides customers
with the best results without any compromise