EMiLE
EUV Micro-interference Lithography Equipment
EMiLE
EMiLE is an stand alone interference EUV lithography tool for repeated lines or
repeated holes printing. To obtain a continuous EUV line patterning, the interference
lithography technology uses the interference phenomenon of EUV light that passes
through two gratings without a EUV mask. Although it cannot expose a random pattern,
this can be utilized in many EUV R&D side or early stages of EUV material development.
The possible resolution is 5nm node or less. Many application can be applied
with this cost effective EUV patterning method.
repeated holes printing. To obtain a continuous EUV line patterning, the interference
lithography technology uses the interference phenomenon of EUV light that passes
through two gratings without a EUV mask. Although it cannot expose a random pattern,
this can be utilized in many EUV R&D side or early stages of EUV material development.
The possible resolution is 5nm node or less. Many application can be applied
with this cost effective EUV patterning method.
- Advantages
-
- Cost effective EUV patterning of periodic lines and holes
- Stand alone interference EUV lithography tool without
EUV mask - Effective Cost of ownership for EUV material or tool
development - Customized line / hole size for user demand
- Applications
-
- EUV resist development
- EUV under layer development
- EUV process tool development
- EUV resist sensitivity monitoring for stable production
- EUV lithography condition pre-check before EUV
scanner using
