Ephase
EUV mask phase measurement system
Ephase
An Ephase is world first EUV mask phase measurement system for EUV PSM
(Phase Shift Mask) verification.
(Phase Shift Mask) verification.
Today, Industry use EUV binary mask for 7nm node, but EUV PSM would be a strong
candidate for the performance optimization of future EUV imaging below the 5nm
node beyond. Industry exploring EUV PSM to reduce mask 3D effect, best focus shift
and contrast fading. Att. EUV PSM gives more NILS(Normalized Image Log Slope)
gain relative to conventional Ta based absorber.
candidate for the performance optimization of future EUV imaging below the 5nm
node beyond. Industry exploring EUV PSM to reduce mask 3D effect, best focus shift
and contrast fading. Att. EUV PSM gives more NILS(Normalized Image Log Slope)
gain relative to conventional Ta based absorber.
ESOL has developed direct measurement method of double slit interference which
gives high sensitivity of phase of EUV light diffraction. This system will help the users
who want to quantify the exact phase amount in EUV PSM production so that can
maximize patterning performance.
gives high sensitivity of phase of EUV light diffraction. This system will help the users
who want to quantify the exact phase amount in EUV PSM production so that can
maximize patterning performance.
- Advantages
-
- World first EUV phase measurement system
- High speed and high accuracy EUV phase measurement
- Small foot print
- Applications
-
- Monitoring EUV PSM for stable production
- Monitoring process error during PSM production
- Monitoring phase amount of EUV blank
