EUVPTR
EUV pellicle transmission and reflectance measurement system
EUVPTR
EUVPTR is a tool provides massive transmittance and reflectance data of EUV Pellicle.
EUV pellicle is a essential material for successful EUV lithography. The quality of EUV
pellicle may give a great influence on patterning, unlike ArF pellicle, which has high
transmittance. Not only to measure the membrane quality before delivery to wafer fab,
but the transmittance or reflectance may change when exposed to EUV light for
a very long time while using it.
EUV pellicle is a essential material for successful EUV lithography. The quality of EUV
pellicle may give a great influence on patterning, unlike ArF pellicle, which has high
transmittance. Not only to measure the membrane quality before delivery to wafer fab,
but the transmittance or reflectance may change when exposed to EUV light for
a very long time while using it.
ESOL's EUVPTR can measure the transmittance and reflectance of the entire
EUV Pellicle at a very high speed. Based on these results, EUV lithographers can
obtain higher performance of EUV patterning so that higher yield can be expected.
EUV Pellicle at a very high speed. Based on these results, EUV lithographers can
obtain higher performance of EUV patterning so that higher yield can be expected.
- Advantages
-
- High speed and massive measurements of
EUV transmittance and reflectivity
- High speed and massive measurements of
- Applications
-
- Quality assurance for EUV pellicle manufacturing
- Incoming inspection of EUV pellicle
- Real time quality monitoring of EUV pellicle during
EUV production - Compensation of EUV mask CD uniformity
after EUV pellicle mounting
Transmission uniformity
Reflectance uniformity